01. Andrea Meo, Politecnico di Bari (PoliBA), Italy

02. Atsufumi Hirohata, Tohoku University

03. Can Onur Avci, Institute of Materials Science of Barcelona (ICMAB-CSIC)

04. Cheng SONG, Tsinghua University

05. Ding-Fu Shao, University of Chinese Academy of Sciences

06. DING Haifeng, Nanjing University

07. Gao Weibo, Nanyang Technological University

08. Geun-Hee Lee, Korea Advanced Institute of Science and Technology

09. Gyung-Min Choi, Sungkyunkwan University, Korea

10. Han XiuFeng, Institute of Physics, China

11. Ho Pin, A*STAR Institute of Materials Research and Engineering (A*STAR IMRE)

12. Huaqing Yin, Seagate Technology

13. Hyun-Woo Lee, Pohang University of Science and Technology
14. J. Åkerman, University of Gothenburg

15. Jian SHEN, Fudan University

16. Jinxing Zhang, Beijing Normal University

17. Junlin Wang, Guangdong University of Technology

18. Junling Wang, City University of Hong Kong

19. Kab-Jin Kim, Korea Advanced Institute of Science and Technology

20. Liang Liu, Shanghai Jiaotong University

21. Mara Strungaru, University of Manchester
22. Mathias Kläui, Johannes Gutenberg University Mainz

23. Nuno Caçoilo, Tohoku University
24. Peng Li, University of Science and Technology of China
25. Poramed Wongjom, Thammasart University

26. Richard Evans, University of York

27. Sergiu Ruta, Sheffield Hallam University
28. Shengyuan Yang, The Hong Kong Polytechnic University
29. Shou-Guo WANG, Anhui University

30. Stephanie Hernandez, Seagate Technology

31. TAKAHASHI Yukiko, National Institute for Materials Science (NIMS)

32. Theo Rasing, Radboud University

33. Tianxiang Nan, Tsinghua University
34. Udomsilp Pinsook, Chulalongkorn University
35. Weijia Fan, Tongji University

36. Xianzhe Chen, Fudan University

37. Xiaohong Xu, Shanxi Normal University

38. Yong Xu, Beihang University, China